VertaCure XP G2

A fully automated vacuum cure system, equipped with a five-zone uniform temperature control.

The single-step process enables short cure times and high throughput while delivering superior mechanical, thermal and electrical properties for a large variety of polyimide FO and passivation applications.

Offering 200 and 300 mm wafer compatibility, which is HVM proven performance at the world’s leading semiconductor fabs.

Values

Laminar flow technology

Provides superior particle performance

Short cure time

Increases the throughput and throughput density, reducing the cost of ownership

Protects vacuum lines

Built-in condensate trap protects vacuum lines, valves, and vacuum pump from solvent condensates

Applications

Polyimide, PBO, and epoxy cure

Lower pressure polymer cure

Photoresist cure

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VertaCure XP G2

High Temperature Annealing :  "A solution designed to replace the single panel vacuum processing method.

The single-step process enables short cure times and high throughput while delivering superior mechanical, thermal and electrical properties for a large variety of polyimide FO and passivation applications.

Offering 200 and 300 mm wafer compatibility, which is HVM proven performance at the world’s leading semiconductor fabs.

Key Features:

Laminar flow technology

Provides superior particle performance

Short cure time

Increases the throughput and throughput density, reducing the cost of ownership

Protects vacuum lines

Built-in condensate trap protects vacuum lines, valves, and vacuum pump from solvent condensates

To learn more about this new technology, please contact us.

Contact us

We have received your message and will reply soon