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Wet Processing Tool

Wet chemistry tool capable of running multiple processes for either R&D or volume manufacturing.

Values

Low COO

Low COO due to high throughput per footprint with efficient chemistry utilization.

Versatile process capabilities

Standard cleans, metal etch (Cu, Ti, TiW, Al, etc.), glass etch for TGV and cavity creation, electroless plating, desmear and solvent processes

Flexible configuration

System is configurable for batch or single wafer sizes from 100 mm to 300 mm, and panels up to 515 mm

Applications

Universities

R&D facilities

Pilot lines

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High Temperature Annealing :  "A solution designed to replace the single panel vacuum processing method.

Key Features:

Low COO

Low COO due to high throughput per footprint with efficient chemistry utilization.

Versatile process capabilities

Standard cleans, metal etch (Cu, Ti, TiW, Al, etc.), glass etch for TGV and cavity creation, electroless plating, desmear and solvent processes

Flexible configuration

System is configurable for batch or single wafer sizes from 100 mm to 300 mm, and panels up to 515 mm

To learn more about this new technology, please contact us.

Contact us

We have received your message and will reply soon